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ATOMIC LAYER DEPOSITION
INTERNATIONAL JOURNAL
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Research Article
Atmospheric-pressure plasma-enhanced spatial atomic layer deposition of silicon nitride at low temperature
Jie Shen
,
Fred Roozeboom
,
Alfredo Mameli
10.3897/aldj.1.101651
27-03-2023
Unique: 2078 | Total: 3021
| Access Period:
1-11
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Research Article
Transformation kinetics for low temperature post-deposition crystallization of TiO
2
thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water
Jamie P. Wooding
,
Shawn A. Gregory
,
Amalie Atassi
,
Guillaume Freychet
,
Kyriaki Kalaitzidou
,
Mark D. Losego
10.3897/aldj.1.101276
27-03-2023
Unique: 1737 | Total: 2379
| Access Period:
1-18
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