Atmospheric-pressure plasma-enhanced spatial atomic layer deposition of silicon nitride at low temperature

Jie Shen; Fred Roozeboom; Alfredo Mameli

doi:10.3897/aldj.1.101651

Research Article

Atomic Layer Deposition 1: 1-11
https://doi.org/10.3897/aldj.1.101651 (27 Mar 2023)

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Atomistic-to-reactor digital twin for silicon nitride atomic layer deposition via bidirectional kinetic Monte Carlo-computational fluid dynamics coupling. Chemical Engineering Journal 545: 177940.

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