Atomic Layer Deposition, international journal – ALDJ- is a diamond open access journal, and publishes peer reviewed scientific articles in all aspects of Atomic Layer Deposition and related alternating vapor phase technologies, such as Molecular Layer Deposition, Vapor Phase Infiltration, Atomic Layer Etching and more. The journal is open to literature research publications from all over the world, submitted in the English language. Articles must be original and arising from the authors’ own research. Prior to publication, they must undergo an external double blind review process.

Effective integration of perspectives of academia, industry, governmental organization, and rapid translation of these discoveries to the articles is essential for realizing the potential of the next era of ALD research.

To achieve the next paradigm shift in the integration of basic science, ALD and industrial applications, scientific collaborations call for precise and deep understanding of mutual interests, paving the way for a rationale balance between the different fundamental interests of academic researchers and industry representatives.

Publication types:

Research article, Review article, Short communication, Methods, Editorial

ISSN 2772-2570 (online)
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