ALD Journal
ALD News Magazine
Register
|
Login
ATOMIC LAYER DEPOSITION
INTERNATIONAL JOURNAL
Full Text
Author
Title
About
Articles
Issues
Contacts
Author
Mark Losego
Georgia Tech.
Georgia, United States of America
https://www.mse.gatech.edu/people/mar...
2 articles by this author
Sort by:
Publication date newest
Publication date oldest
Total views
Unique views
Best match
Citations count
Highly accessed (last month)
Highly accessed (last 3 months)
Highly accessed (last 6 months)
Highly accessed (last year)
Research Article
Crystalline as-deposited TiO
2
anatase thin films grown from TDMAT and water using thermal atomic layer deposition with
in situ
layer-by-layer air annealing
Jamie P. Wooding
,
Kyriaki Kalaitzidou
,
Mark D. Losego
10.3897/aldj.2.117753
04-06-2024
Unique: 1315 | Total: 1897
| Access Period:
1-18
HTML
XML
PDF
Research Article
Transformation kinetics for low temperature post-deposition crystallization of TiO
2
thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water
Jamie P. Wooding
,
Shawn A. Gregory
,
Amalie Atassi
,
Guillaume Freychet
,
Kyriaki Kalaitzidou
,
Mark D. Losego
10.3897/aldj.1.101276
27-03-2023
Unique: 2127 | Total: 2948
| Access Period:
1-18
HTML
XML
PDF
This website uses cookies in order to improve your web experience.
Read our Cookies Policy
OK