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(5)
  • Carina Hedrich, Robert H. Blick, Martin Ritter, Robert Zierold, Kaline P. Furlan (2026)
    Functional vanadium oxide nanostructures fabricated via atomic layer deposition: A review. Applied Materials Today 50: 103248. CrossRef DOI: 10.1016/j.apmt.2026.103248
  • Hana Krýsová, Tomáš Imrich, Hana Tarábková, Pavel Janda, Josef Krýsa (2026)
    Impact of variations in ALD procedure on nanomorphology, protecting properties and chemical stability of thin TiO2 films. RSC Advances 16: 8658. CrossRef DOI: 10.1039/D5RA09703G
  • Dominic A. Dalba, Somayeh Saadat Niavol, Xiaoman Zhang, Wangwang Xu, Bipin Bhattarai, Indeewari M. Karunarathne, Dilan M. Gamachchi, Dongmei Cao, W. J. Meng, Andrew C. Meng (2025)
    Ferroelectricity in amorphous aluminum oxynitride films synthesized by inductively coupled plasma assisted atomic layer deposition. Journal of Vacuum Science & Technology B 43: . CrossRef DOI: 10.1116/6.0004218
  • Jamie P. Wooding, Kyriaki Kalaitzidou, Mark D. Losego (2024)
    Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1. CrossRef DOI: 10.3897/aldj.2.117753
  • Gwangsik Jeon, Jeongwoo Jeon, Woohyun Kim, Daehyeon Kim, Wontae Noh, Wonho Choi, Byongwoo Park, Sangmin Jeon, Sungjin Kim, Chanyoung Yoo, Cheol Seong Hwang (2025)
    Low-temperature atomic layer deposition of metastable MnTe films for phase change memory devices. Journal of Materials Chemistry C 13: 6762. CrossRef DOI: 10.1039/D4TC05499G
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