Alfredo Mameli, Kanda Tapily, Jie Shen, Fred Roozeboom, Mengcheng Lu, David O’Meara, Scott P. Semproni, Jiun-Ruey Chen, Robert Clark, Gert Leusink, Scott Clendenning (2024)
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2.
ACS Applied Materials & Interfaces16: 14288.
DOI: 10.1021/acsami.3c17917
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