Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water

Jamie P. Wooding; Shawn A. Gregory; Amalie  Atassi; Guillaume Freychet; Kyriaki Kalaitzidou; Mark D. Losego

doi:10.3897/aldj.1.101276

Research Article

Atomic Layer Deposition 1: 1-18
https://doi.org/10.3897/aldj.1.101276 (27 Mar 2023)

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Dominic A. Dalba, Somayeh Saadat Niavol, Xiaoman Zhang, Wangwang Xu, Bipin Bhattarai, Indeewari M. Karunarathne, Dilan M. Gamachchi, Dongmei Cao, W. J. Meng, Andrew C. Meng (2025)
Ferroelectricity in amorphous aluminum oxynitride films synthesized by inductively coupled plasma assisted atomic layer deposition. Journal of Vacuum Science & Technology B 43: .

DOI: 10.1116/6.0004218

Jamie P. Wooding, Kyriaki Kalaitzidou, Mark D. Losego (2024)
Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1.

DOI: 10.3897/aldj.2.117753

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Low-temperature atomic layer deposition of metastable MnTe films for phase change memory devices. Journal of Materials Chemistry C 13: 6762.

DOI: 10.1039/D4TC05499G

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