Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing


	Percent crystallinity determined from image analysis of top-view SEM micrographs versus ALD process time for TDMAT/H2O/air ALD films deposited 180 °C, 200 °C, and 220 °C.

Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO ₂ anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753