SEM micrographs for films deposited at 200 °C by TDMAT/H2O/air ALD from (a) 114 cycles, (b) 227 cycles, (c) 341 cycles, (d) 444 cycles, (e) 568 cycles, and (f) 1120 cycles. These number of cycles correspond to approximately 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, and 52 nm film thickness respectively.