Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing


	SEM micrographs for films deposited at 180 °C by TDMAT/H2O/air ALD from (a) 114 cycles, (b) 409 cycles, (c) 444 cycles, (d) 568 cycles, (e) 800 cycles, and (f) 1120 cycles. This corresponds to approximately 5 nm, 18 nm, 19 nm, 25 nm, 35 nm, and 51 nm film thickness respectively.

Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO ₂ anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753