Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing


	XPS Ti2p elemental scan for (a) TDMAT/H2O ALD at 180 °C, (b) TDMAT/H2O/air ALD at 180 °C, (c) TDMAT/H2O ALD at 200 °C, (d) TDMAT/H2O/air ALD at 200 °C, (e) TDMAT/H2O ALD at 220 °C, and (f) TDMAT/H2O/air ALD at 220 °C.

Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO ₂ anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753