Raman spectra for TDMAT/H2O ALD and TDMAT/H2O/air ALD TiO2 films deposited at (a) 180 °C, (b) 200 °C, and (c) 220 °C. For each deposition temperature, (i) 50 nm TDMAT/H2O/air ALD, (ii) 25 nm TDMAT/H2O/air ALD, and (iii) 50 nm TDMAT/H2O ALD spectra are presented. Spectra are normalized to the Si peak at 521 cm-1. TiO2 stretching modes are labeled as Eg (*) and B1g (#).

 
 
  Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753