Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing


	SEM micrographs for films deposited at 180 °C: (a) 568 cycles TDMAT/H2O/air ALD, (b) 568 cycles TDMAT/H2O/air followed by 552 cycles TDMAT/H2O ALD, and (c) 1120 cycles TDMAT/H2O/air ALD.

Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO ₂ anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753