SEM micrographs for TDMAT/H2O/air ALD-TiO2 15 nm thin films deposited at 200 °C from 341 cycles: (a) baseline 35 s air anneal process for 91.4 s total cycle time, (b) post-H2O N2 purge increased from 15 s to 20 s for 96.4 s total cycle time, (c) 40 s air dose for 96.4 s total cycle time, and (d) post-air N2 time increased from 35 s to 40 s for 96.4 s total cycle time. In the image titles, x refers to a 1 s TDMAT/5 s N2/0.4 s H2O dosing scheme, which is held constant for the different conditions.

 
 
  Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753