Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing

Figure 1.

SEM micrographs for (a) as-deposited film morphologies at ALD temperatures increasing from 180 °C (bottom row) to 220 °C (top row) with 1120 ALD cycles from TDMAT/H₂O chemistry at 91.4 s per cycle. (b) SEM micrographs for TDMAT/H₂O/air ALD film morphologies at temperatures increasing from 180 °C (bottom row) to 220 °C (top row) with 1120 ALD cycles with 91.4 s per cycle, including a 35 s air dose per cycle.

	Figure 1. SEM micrographs for (a) as-deposited film morphologies at ALD temperatures increasing from 180 °C (bottom row) to 220 °C (top row) with 1120 ALD cycles from TDMAT/H₂O chemistry at 91.4 s per cycle. (b) SEM micrographs for TDMAT/H₂O/air ALD film morphologies at temperatures increasing from 180 °C (bottom row) to 220 °C (top row) with 1120 ALD cycles with 91.4 s per cycle, including a 35 s air dose per cycle.
	Part of: Wooding JP, Kalaitzidou K, Losego MD (2024) Crystalline as-deposited TiO ₂ anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing. Atomic Layer Deposition 2: 1-18. https://doi.org/10.3897/aldj.2.117753