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Figure 13.
GIXRD scans for 1120 total cycles TiO2 thin films deposited at 180 °C. Bottom to top: Si wafer substrate, TDMAT/H2O ALD, 3:1 TDMAT/H2O ALD to TDMAT/H2O/air ALD, 1:1 TDMAT/H2O ALD to TDMAT/H2O/air ALD, and TDMAT/H2O/air ALD. The three primary TiO2-anatase peaks are labeled where present: 2θ = 25.3°, 37.8°, 48.0°.