SEM micrographs for TDMAT/H₂O/air ALD-TiO₂ 15 nm thin films deposited at 200 °C from 341 cycles: (a) baseline 35 s air anneal process for 91.4 s total cycle time, (b) post-H₂O N₂ purge increased from 15 s to 20 s for 96.4 s total cycle time, (c) 40 s air dose for 96.4 s total cycle time, and (d) post-air N₂ time increased from 35 s to 40 s for 96.4 s total cycle time. In the image titles, x refers to a 1 s TDMAT/5 s N₂/0.4 s H₂O dosing scheme, which is held constant for the different conditions.