Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition


	(a) XPS depth profiling showing the relative atomic percentage of titanium in the surface and subsurface of AP-ALD-coated PDMS samples cured at 70 °C, 150 °C, 200 °C, and (b) XPS elemental analysis of the surface.

Part of: Santoso A, van den Berg BJ, Saedy S, Goodwin E, van Steijn V, van Ommen JR (2023) Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition. Atomic Layer Deposition 1: 1-13. https://doi.org/10.3897/aldj.1.105146