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Contents in atomic percentage of O (red triangle), C (black square), Si (purple dot), N (blue dot) in the bulk of the spatial ALD grown SiNx layers as a function of the N2 plasma exposure time. |
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| Part of: Shen J, Roozeboom F, Mameli A (2023) Atmospheric-pressure plasma-enhanced spatial atomic layer deposition of silicon nitride at low temperature. Atomic Layer Deposition 1: 1-11. https://doi.org/10.3897/aldj.1.101651 |