a) Crystal growth rates plotted as a function of deposition temperature for ALD-TiO2 films deposited at 120 °C, 140 °C, and 160 °C. b) Arrhenius plot for crystal growth rate for TiO2 films deposited at 120 °C, 140 °C, and 160 °C with linear regression lines of best fit and 95% confidence intervals. The R-square values for 120 °C, 140 °C, and 160 °C lines respectively are: 0.001, 0.123, and 0.056.

 
 
  Part of: Wooding JP, Gregory SA, Atassi A, Freychet G, Kalaitzidou K, Losego MD (2023) Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water. Atomic Layer Deposition 1: 1-18. https://doi.org/10.3897/aldj.1.101276