a) Log-linear plot of nucleation rates as a function of post-deposition annealing (PDA) temperature for ALD-TiO2 thin films deposited at 120 °C, 140 °C, and 160 °C. b) Linearized nucleation rate equation for films deposited at 120 °C, 140 °C, and 160 °C with linear regression line of best fit.

 
 
  Part of: Wooding JP, Gregory SA, Atassi A, Freychet G, Kalaitzidou K, Losego MD (2023) Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water. Atomic Layer Deposition 1: 1-18. https://doi.org/10.3897/aldj.1.101276