Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water

	Figure 5. Arrhenius dependence for reaction rate k, relating to the combined activation energy for crystal nucleation and growth.
	Part of: Wooding JP, Gregory SA, Atassi A, Freychet G, Kalaitzidou K, Losego MD (2023) Transformation kinetics for low temperature post-deposition crystallization of TiO ₂ thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water. Atomic Layer Deposition 1: 1-18. https://doi.org/10.3897/aldj.1.101276