a) SEM micrographs for ALD films grown at 120 °C, 140 °C, and 160 °C: as-deposited (left) vs. post-deposition annealed at 200 °C in air (right). Anneal times to achieve apparent full crystallinity are listed on micrographs. Note the scale bar is different in the 120 °C PDA 200 °C micrograph to capture the large grain size. b) GIXRD scans for as-deposited and annealed (PDA at 200 °C in air) films deposited at 120 °C, 140 °C, and 160 °C. The three primary TiO2-anatase peaks are labeled: 2θ = 25.3°, 37.8°, 48.0°.

 
 
  Part of: Wooding JP, Gregory SA, Atassi A, Freychet G, Kalaitzidou K, Losego MD (2023) Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water. Atomic Layer Deposition 1: 1-18. https://doi.org/10.3897/aldj.1.101276