Plot of the crystal-size-to-film-thickness ratio as a function of the crystallization temperature compiled from various TiO2 ALD literature reports. All reports use thermal-ALD with water as the co-reactant. Varying titanium precursor and substrate chemistries are noted by data point shape as indicated in the legend. Conditions reported include: TiCl4/H2O on Si as deposited (black square), TiCl4/H2O on Al2O3 as deposited (green square), TiCl4/H2O on Al2O3 with PDA (circled green square), TDMAT/H2O on Si as deposited (red circle), and TDMAT/H2O on Si with PDA, which are the results from this study (circled red star). Films that undergo PDA are all circled in blue.

 
 
  Part of: Wooding JP, Gregory SA, Atassi A, Freychet G, Kalaitzidou K, Losego MD (2023) Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water. Atomic Layer Deposition 1: 1-18. https://doi.org/10.3897/aldj.1.101276